[17p-B5-1~21] 13.3 Insulator technology

△ [17p-B5-13] Control of Structure of GeO_x Thin Film Using Low-Temperature and Damage-Free Neutral-Beam Oxidation Process

^○Daiki Nakayama¹, Takeo Ohno², Rui Zhang³, Shinichi Takagi³, Seiji Samukawa^1,2 (IFS, Tohoku Univ.¹, WPI-AIMR, Tohoku Univ.², Univ. of Tokyo³)

Keywords:中性粒子ビーム後酸化法,ビームエネルギー,ゲルマニウム酸化膜