[17p-P2-1~49] 8 Plasma Electronics

[17p-P2-32] Research on Effect of BCl₃ on Dry Etching of AlGaN

^○Pucheng Liu¹, Hiroaki Yonezawa², Kuniyuki Kakushima², Yoshinori Kataoka², Akira Nishiyama², Nobuyuki Sugii², Hitoshi Wakabayashi², Kazuo Tsutsui², Kenji Natori¹, Hiroshi Iwai¹ (Tokyo Tech. FRC¹, Tokyo Tech. IGSSE²)

Keywords:AlGaN エッチング