[18a-A4-1~9] 16.2 Processing technologies and devices

[18a-A4-2] Effect of Anneal on Structural Property Distribution of Solution-Processed a-Si:H Films Along Thickness Direction

^○(M2)Yoo Sakuma¹, Keisuke Ohdaira^1,2, Takashi Masuda^1,3, Zhongrong Shen^1,2, Hideyuki Takagishi^1,2, Tatsuya Shimoda^1,2,3 (JAIST¹, JST-ALCA², JST-ERATO³)

Keywords:液体シリコン,溶液プロセス,Raman