The 74th JSAP Autumn Meeting,2013

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Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[18a-C1-1~5] 8.3 Plasma deposition of thin film and surface treatment

Wed. Sep 18, 2013 9:00 AM - 10:15 AM C1 (TC3 1F-101)

9:00 AM - 9:15 AM

[18a-C1-1] HfO2 Deposition on Graphene with Plasma Enhanced Atomic Layer Deposition

○Takeshi Kitajima1, Toshiki Nakano1 (Nat. Def. Acad.1)

Keywords:グラフェン,原子層堆積