[18a-C1-1~5] 8.3 Plasma deposition of thin film and surface treatment

△ [18a-C1-3] Effect of gas flow rate on crystalline structures and radical density of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

^○Da Xu¹, Lingyun Jia¹, Masayuki Nakamura¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

Keywords:amorphous carbon films,PECVD