[18a-C2-1~8] 8.4 Plasma etching

[18a-C2-2] Feature Profile Evolution for plasma etching using on-wafer monitoring system

^○Tomohiro Kubota¹, Michio Sato², Takuya Iwasaki³, Kohei Ono³, Seiji Samukawa^1,4 (IFS, Tohoku Univ.¹, Harada Corp.², Mizuho I&R Inst.³, WPI-AIMR, Tohoku Univ.⁴)

Keywords:オンウェハセンサ,プラズマ計測,イオン軌道予測