[18a-D6-1~9] 14.2 Ultrathin films and quantum nanostructures

▼ [18a-D6-6] Formation and Characterization of a Three Dimensional Silicon Quantum Dot Superlattice Fabricated by Top-Down Process Using Bio-Template and Neutral Beam Etching Technology for its Application to a High Efficiency Quantum Dot Solar Cell

^○Mohammad Rahman^1,4, Makoto Igarashi^1,4, Weiguo Hu^1,4, Mohd Erman Fauzi^1,4, Yusuke Hoshi², Noritaka Usami², Seiji Samukawa^1,3,4 (IFS, Tohoku Univ.¹, Nagoya Univ.², WPI-AIMR, Tohoku Univ.³, JST-CREST⁴)

Keywords:シリコン量子ドット太陽電池,ミニバンド,3次元ナノディスクアレイ