Void Formation by High Temperature Annealing of High-Aspect-Ratio Holes on Si(001)

Presentation information

Oral presentation

06. Thin Films and Surfaces » 6.5 Surface physics and vacuum

Wed. Sep 18, 2013 1:00 PM - 5:45 PM D2 (MK 1F-102)

4:45 PM - 5:00 PM

^○Koichi Sudoh¹, Reiko Hiruta², Hitoshi Kuribayashi² (Osaka University¹, Fuji Electric Co., Ltd.²)

Keywords:表面拡散