[19a-C1-1~11] 8.2 Plasma measurements and diagnostics

△ [19a-C1-3] Characteristic Impedance Monitoring Method for Fault Detection in Plasma Production Line

^○Taisei Motomura¹, Yuji Kasashima¹, Osamu Fukuda¹, Fumihiko Uesugi¹, Hiroyuki Kurita², Naoya Kimura² (MSRC, AIST¹, ADVANTEST Corporation²)

Keywords:プラズマプロセス,インピーダンス,プロセスモニタリング