[19a-C2-1~12] 8.5 Plasma nanotechnology

[19a-C2-9] In-situ Conductance Measure of Ni Thin Films During Sputtering Depositions

^○Yuji Kusumoto¹, Hirofumi Koji¹, Kazuki Sekiya¹, Hirishi Furuta^1,2, Akimitsu Hatta^1,2 (Kochi Univ. Techonol.¹, Inst. Nanotech.²)

Keywords:スパッタ,コンダクタンス