The 74th JSAP Autumn Meeting,2013

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Oral presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

[19a-C7-1~15] 6.4 New thin-film materials

Thu. Sep 19, 2013 9:00 AM - 1:00 PM C7 (TC3 1F-117)

10:30 AM - 10:45 AM

[19a-C7-7] Structure analysis of annealed HfO2/Si and Y2O3/Si interfaces by XPS

○Yuki Toyoshima1, Shota Taniwaki1, Yasushi Hotta1,3, Haruhiko Yoshida1,3, Koji Arafune1,3, Atsushi Ogura2,3, Shiniti Satoh1,3 (Univ. of Hyogo1, Meiji Univ.2, JST-CREST3)

Keywords:界面,High-k,シリコン