[19a-P3-1~27] 6.3 Oxide-based electronics

△ [19a-P3-3] Fabrication of TiO₂ thin film for photocatalyst by atomic layer deposition

^○Fumiya Tanaka¹, Takahiro Shimizu¹, Yoshiko Nishimura², Kiyoshi Sannou², Kaoru Hamabe², Kazuki Ueda³, Kota Kato³, Hisayoshi Kobayashi³, Takahisa Jitsuno⁴, Mitsuru Inada¹, Tadashi Saito¹ (Kansai Univ.¹, EMATEC Japan², Kyoto Inst. of Tech³, ILE Osaka Univ.⁴)

Keywords:光触媒,ALD,原子層堆積法