The 74th JSAP Autumn Meeting,2013

Presentation information

Oral presentation

08. Plasma Electronics » 8.1 Plasma production and control

[19p-C1-1~17] 8.1 Plasma production and control

Thu. Sep 19, 2013 1:30 PM - 6:00 PM C1 (TC3 1F-101)

1:45 PM - 2:00 PM

[19p-C1-2] Dependence of the Production of Highly Charged Ions on Two Frequencies in Electron Cyclotron Resonance Heating (4)

Atsushi Kitagawa1, Masayuki Muramatsu1, Arne G. Drentje1, Keisuke Yano2, Yushi Kato2, Sandor Biri3, Noriyuki Sasaki4, Wataru Takasugi4 (NIRS1, Osaka Univ.2, ATOMKI3, AEC4)

Keywords:イオン源