2:00 PM - 2:15 PM
△ [19p-C1-3] Dependence of ion beam currents and plasma parameter on the shape of magnetic configuration in the tandem type ECRIS
Keywords:ECR,イオン源,イオンビーム
Oral presentation
08. Plasma Electronics » 8.1 Plasma production and control
Thu. Sep 19, 2013 1:30 PM - 6:00 PM C1 (TC3 1F-101)
2:00 PM - 2:15 PM
Keywords:ECR,イオン源,イオンビーム