[19p-P8-1~10] 14.1 Physical properties of exploratory materials

[19p-P8-1] Effect of deposition rate on the fabrication of -FeSi2 thin film by means of ion beam sputter deposition method

^○satoshi hamamoto¹, kenji yamaguchi², kiichi hojou² (Ibaraki Univ¹, JAEA²)

Keywords:シリサイド半導体,環境半導体,表面処理