[20a-B4-1~11] 13.5 Si process technology

[20a-B4-3] Minimal System of Micro-Plasma Dry Etcher Equipment

^○Hiroyuki Tanaka², Shizuka Nakano^1,2, Yoshiki Shimizu^1,2, Hisato Ogiso^1,2, Shinji Futagawa³, Hideaki Yoshioka³, Takahiro Fukuda³, Yoshinori Uchiyama³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (AIST¹, MINIMAL², Design Network³)

Keywords:ミニマルファブ,マイクロプラズマ