[20a-B4-1~11] 13.5 Si process technology

[20a-B4-4] Influence of edge beveling in small diameter wafer for resist coating

^○Shuuji Okuda¹, Norio Umeyama^1,2, Atsushi Yamazaki^1,3, Haruo Sumizawa^1,3, Koichiro Ichikawa^1,3, Sho Takeuchi^1,4, Yoshihisa Sensu^1,4, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (MINIMAL¹, AIST², Fujikoshi³, LTJ⁴)

Keywords:MINIMAL,ハーフインチウェハ,ミニマルファブ