[20a-B4-1~11] 13.5 Si process technology

[20a-B4-6] Sputter Deposition Equipment for Minimal Fab

^○Hisato Ogiso^1,2, Shizuka Nakano^1,2, Ken Yukimura¹, Akihiko Kato^2,3, Yuki Yabuta^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (AIST¹, Minimal², Seinan³)

Keywords:Minmal fab