Control of supersaturation by mask pattern in GaAs microchannel epitaxy

Masafumi Tomita

Presentation information

Oral presentation

15. Crystal Engineering » 15.7 Fundamentals of epitaxy

[20p-D3-1~6] 15.7 Fundamentals of epitaxy

Fri. Sep 20, 2013 1:00 PM - 2:30 PM D3 (MK 2F-201)

2:15 PM - 2:30 PM

[20p-D3-6] Control of supersaturation by mask pattern in GaAs microchannel epitaxy

^○Masafumi Tomita¹, Hiroyuki Takakura¹, Muneki Iwakawa¹, Yosuke Mizuno¹, Junpei Yamada¹, Takeshige Hishida¹, Daisuke Kanbayashi¹, Shigeya Naritsuka¹ (Meijo Univ.¹)

Keywords:MCE,LPE,GaAs

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