○Kazuyuki Kohama1,2, Tomohiko Iijima1, Misa Hayashida1, Shinichi Ogawa1 (AIST1, JSPS2)
Session information
Regular sessions(Oral presentation)
13. Semiconductors A (Silicon) » 13.5 Si process technology
[28a-G6-1~11] 13.5 Si process technology
Thu. Mar 28, 2013 10:00 AM - 12:45 PM G6 (B5 1F-2106)
△:Young Scientist Oral Presentation Award Applied
▲:English Presentation
▼:Both Award Applied and English Presentation
○Misa Hayashida1, Tomohiko Iijima1, Masahiro Tsukahara1, Shiniichi Ogawa1 (AIST1)
○Ryouichi Irita1,2, Kenji Miyake1,2, Norio Umeyama2, Sommawan Khumpuang2,3, Shiro Hara2,3 (PMT1, MINIMAL2, AIST3)
○Takashi Chiba1,2, Masao Terada1,2, Sommawan Khumpuang2,3, Shinichi Ikeda2,3, Takashi Yajima2, Shiro Hara2,3 (Sakaguchi E.H VOC Corp.1, Minimal Fab Development Association2, AIST3)
○Hitoshi Maekawa1, 2, Sommawan Khumpuang1, 2, Shiro Hara1, 2 (AIST1, MINIMAL2)
Isamu Taguchi1, Masahiko Mitsuhashi1, Nobuo Matsumoto2, ○Toshio Kato2, Ken Otajima3, Reiko Kanzaki3 (Kanagawa Industrial Technology Research institute1, Co., Ltd G-Quest2, Asey Indutrial Co.,Ltd3)
Takayuki Kadonome1, Atsushi Matsumura1, Tsuyoshi Higashiyama1, Shohei Oyama1, Tokiyoshi Matsuda1, ○Mutsumi Kimura1 (Ryukoku Univ.1)
○(M2)Yoshitaka Kobayashi1, Kouhei Sakaike1, Shogo Nakamura1, Muneki Akazawa1, Seiichiro Higashi1 (Hiroshima Univ.1)
○Tatsuro Maeda1, Hiroyuki Ishii1, Taro Itatani1, Wipakorn Jevasuwan1, Tetsuji Yasuda1, Osamu Ichikawa2, Masahiko Hata2 (AIST1, Sumitomo Chemical2)
○(PC)Eiko Mieda1, Tatsuro Maeda1, Noriyuki Miyata1, Tetsuji Yasuda1, Atsuhiko Maeda1, Yuichi Kurashima1, Hideki Takagi1, Takeshi Aoki2, Taketsugu Yamamoto2, Kikuchi Toshiyuki3, Osamu Ichikawa2, Takenori Osada2, Masahiko Hata2, Arito Ogawa3, Yasuo Kunii3 (AIST1, Sumitomo Chemical2, Hitachi Kokusai Electric3)
○Minoru Oda1, Toshifumi Irisawa1, Yuuichi Kamimuta1, Wipakorn Jevasuwan1, Tatsuro Maeda1, Osamu Ichikawa2, Tsutomu Tezuka1 (AIST1, Sumitomo Chemical Co., Ltd.2)