[29p-F1-1~17] 6.4 New thin-film materials

Fri. Mar 29, 2013 2:00 PM - 6:45 PM F1 (E3 1F-102)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[29p-F1-0] Lunch(60min)

[29p-F1-1] ▲Introduction of Nanodefects in YBCO Films by Ion-milling Through Anodic Aluminum Oxide Templates (30 min.)

^○Katherine Develos Bagarinao¹, Hiroaki Matsui¹, Iwao Yamaguchi¹, Stuart Wimbush², Judith MacManus-Driscoll² (AIST¹, Univ. of Cambridge²)

[29p-F1-2] ▲Morphology Control of P3HT:PCBM Blend Films Deposited by Electrospray Using High-Voltage Pulse

^○Yingjie Liao¹, Takeshi Fukuda¹, Norihiko Kamata¹ (Saitama University¹)

[29p-F1-3] ▲In Situ Monitoring of Thermal Radiation of Tin-Doped Indium Oxide Thin Films Under Excimer Laser Irradiation

^○Kentaro Shinoda¹, Tomohiko Nakajima¹, Tetsuo Tsuchiya¹ (AIST¹)

[29p-F1-4] ▼New material thin film

^○Tu Tran Uyen Le¹, Akira Sasahara¹, Masahiko Tomitori¹ (Jaist¹)

[29p-F1-5] ▼New Passivation Material for a-IGZO thin film transistor

^○（D）Juan-Paolo Bermundo¹, Yasuaki Ishikawa¹, Haruka Yamazaki¹, Toshiaki Nonaka², Yukiharu Uraoka¹ (Nara Institute of Science and Technology¹, AZ Electronic Materials Manufacturing Japan K.K.²)

[29p-F1-6] ▼Growth of Morphology-Controlled Ga₂O₃ Nanowires by High Temperature Glancing Angle Deposition

^○Haruhiko Minamitake¹, Motofumi Suzuki¹, Kaoru Nakajima¹, Kenji Kimura¹, Chia-Wei Hsu², Li-Jen Chou² (Kyoto Univ.¹, National Tsing-Hua Univ.²)

[29p-F1-7] △Thin Film Deposition of c-BN by CVD Method

^○Masanori Kobayashi¹, Hidetoshi Miyashita², Takahito Ono¹ (Tohoku Univ.¹, Tottori Univ.²)

[29p-F1-7.1] Break(15min)

[29p-F1-8] Preparation of SnO₂ films by coplanar type surface discharge under magnetic field

Toshimichi Hanai¹, Masahiko Iyoda¹, Keigo Nabeta¹, ^○Masayuki Okuya¹ (Shizuoka Univ.¹)

[29p-F1-9] Preparation of SnO₂ thin films by surface discharge technique at room temperature under atmospheric pressure

^○Masato Tan¹, Toshimichi Hanai¹, Masahiko Iyoda¹, Masayuki Okuya¹ (Shizuoka Univ.¹)

[29p-F1-10] Preparation and characterization of Sn and Na co-containing phosphate glass transparent conductive film

^○Yusuke Kumazaki¹ (Chubu Univ.¹)

[29p-F1-11] Fabrication and Evaluation of New Transparent Films Combined Mg-C Powders

^○Takaki Oka¹, Hideki Yoshioka², Shin-ichi Yamamoto¹ (Ryukoku Univ.¹, Hyogo Pref. Inst. of Tech.²)

[29p-F1-12] Switching properties of switchable mirrors based on Mg-Y alloy thin films

^○Yasusei Yamada¹, Mayu Miura¹, Kazuki Tajima¹, Masahisa Okada¹, Kazuki Yoshimura¹ (AIST¹)

[29p-F1-13] Hydrogen absorption and desorption on Pd(111)/Ag(111) thin-film with in-plane lattice expansion

^○Sho Nakajima¹, Yuki Aoki¹, Kan Nakatsuji¹, Hiroyuki Hirayama¹ (Tokyo Tech¹)

[29p-F1-14] Growth and characterization of Co thin films on GaN(0001) surfaces

^○Hiroaki Yamaguchi¹, Masaru Yoneoka², Bin Hasbi Nurassyakirin³, Sigehiko Hasegawa⁴ (Osaka Univ.¹, Osaka Univ.², Osaka Univ.³, Osaka Univ.⁴)

[29p-F1-15] Fabrication of Cubic-La(Sr)MnO3/Hexagonal-ZnO Heterostructures and p-n Junction

^○（M1）Akira Okada¹, Miyoshi Yokura^1,2, Katsuhiko Inaba³, Shintaro Kobayashi³, Nobuyuki Iwata⁴, Philip Reji⁵, Kai Liu⁶, Jayan Thomas⁷, Shunichi Arisawa⁸, Tamio Endo¹ (Mie Univ.¹, Adwel R&D Co.², Rigaku³, Nihon Univ.⁴, Raman Res. Inst. (India)⁵, U. California-Davis (USA)⁶, U. Central Florida⁷, NIMS⁸)

[29p-F1-16] Calculations of Lattice Matching for (111)LSMO/(001)ZnO ; Interface Distortion Energy and Coulomb Energy

^○Toshiki Mori¹, Akinobu Okamoto¹, Akira Okada¹, Miyoshi Yokura^1,2, Rita John³, Hiroshi Kezuka⁴, Kazuhisa Niwano⁵, Hidefumi Motobayashi⁶, Tamio Endo¹ (Mie Univ.¹, Adwel R&D Co.,Ltd², Univ. of Madras, India³, Tokyo U. Tech.⁴, Tateho Chemistry⁵, Toshima mfg. Co.,Ltd⁶)

[29p-F1-17] Changes of Chemical Bonding States of Plasma-irradiated PET: FTIR Analysis

^○Kazuya Hanada¹, Kenichi Uehara², Miyoshi Yokura^1,2, Masatsugu Nagashima³, Masahito Matsui¹, Yuichi Nakamura¹, Kazuhiro Endo⁴, Tamio Endo¹ (Mie Univ.¹, Adwel R&D Co.,Ltd², Stech³, Kanazawa Inst. Tech.⁴)

Session information

[29p-F1-1~17] 6.4 New thin-film materials