[29p-F2-1~19] 6.3 Oxide-based electronics

Fri. Mar 29, 2013 2:00 PM - 7:00 PM F2 (E3 3F-303)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[29p-F2-0] Lunch(60min)

[29p-F2-1] △Physical properties of indium oxynitride (InO_xN_y) epitaxial thin films

^○Sohei Okazaki^1,2, Yasushi Hirose^1,2,3, Shoichiro Nakao^1,2, Chang Yang^1,2,3, Atsushi Suzuki^1,2,3, Daichi Oka^1,2,3, Tetsuya Hasegawa^1,2,3 (KAST¹, JST-CREST², Univ. of Tokyo³)

[29p-F2-2] ITO Thin Films Fabricated by a Hybrid Facing-target Sputtering System

^○Shinichi Morohashi¹, Keita Usui¹, Fumihiro Takaki¹, Naoyuki Harada¹, Takuya Murata¹ (Yamaguchi Univ.¹)

[29p-F2-3] Fabrication of Si-Ti Gradient Composition Thin Films using a Hybrid Facing-target Sputtering System

^○Shinichi Morohashi¹, Hiroyuki Kuzuo¹, Tomoyuki Okada¹, Kengo Kishimoto¹, Naoyuki Harada¹ (Yamaguchi Univ.¹)

[29p-F2-4] Fundamental Strategy for Creating VLS Grown TiO2 Single Crystalline Nanowires

^○Takeshi Yanagida¹, Zhuge Fuwei¹, Kazuki Nagashima¹, Masaki Kanai¹, Tomoji Kawai¹ (ISIR Osaka Univ¹)

[29p-F2-5] △Single Crystalline NiO Nanowires Grown via VLS Mechanism and Their Properties on Resistive Switching Memory

^○Kazuki Nagashima¹, Takeshi Yanagida¹, Masaki Kanai¹, BaeHo Park², Tomoji Kawai^1,2 (ISIR Osaka Univ.¹, Kokuk Univ.²)

[29p-F2-6] Electronic Transport in Ultrathin LaAlO₃/SrTiO₃(001)-(√13 ×√13) Heterostructures

^○Takeo Ohsawa¹, Ryota Shimizu¹, Katsuya Iwaya¹, Susumu Shiraki¹, Taro Hitosugi^1,2 (Tohoku Univ.¹, JST-PRESTO²)

[29p-F2-7] Stoichiometry Control of the Electronic Properties of the LaAlO₃/SrTiO₃ Heterointerface

^○（D）Hiroki Sato^1,2, Christopher Bell¹, Yasuyuki Hikita¹, Harold Hwang^1,3 (SLAC¹, Univ. of Tokyo², Stanford Univ.³)

[29p-F2-8] Band Offset Control Using The Polarity of LaAlO₃ Atomic Layers

^○Takeaki Yajima^1,2, Makoto Minohara², Yasuyuki Hikita², Christopher Bell², Hiroshi Kumigashira³, Masaharu Oshima¹, Harold Hwang^2,4 (Univ. of Tokyo¹, SLAC National Accelerator Laboratory², KEK-PF³, Stanford Univ.⁴)

[29p-F2-9] Electronic Structures of Epitaxial LiTi₂O₄ Transparent Superconducting Films

^○Takeo Ohsawa¹, Akichika Kumatani¹, Ryotaq Shimizu¹, Yoshitaka Takagi¹, Tohru Suzuki¹, Susumu Shiraki¹, Taro Hitosugi¹ (Tohoku Univ.¹)

[29p-F2-9.1] Break(15min)

[29p-F2-10] Control of oxygen-ions diffusion during the reduction of CaFeO_2.5 thin films with a LaAlO₃ cap layer

^○Noriaki Murakami¹, Daisuke Kan¹, Noriya Ichikawa¹, Yuichi Shimakawa^1,2 (ICR,Kyoto Univ.¹, JST-CREST²)

[29p-F2-11] Synthesis and structural analysis of double-brownmillerite oxide thin films

^○Noriya Ichikawa¹, Yuichi Shimakawa^1,2 (ICR, Kyoto Univ.¹, JST-CREST²)

[29p-F2-12] Transient absorption dynamics of BiFeO₃ by white-light pump-probe spectroscopy

^○（M1）Toru Nakamura¹, Yasuhiro Yamada¹, Shintaro Yasui², Hiroshi Funakubo², Yoshihiko Kanemitsu¹ (ICR Kyoto Univ.¹, Tokyo Inst. of Tech.²)

[29p-F2-13] Transport properties of field-effect transistors based on (Fe,Zn)₃O₄ epitaxial thin films

^○Takashi Ichimura¹, Tatsuya Hori¹, Kohei Fujiwara¹, Hidekazu Tanaka¹ (ISIR, Osaka Univ.¹)

[29p-F2-14] Fabrication and Evaluation of [BiMO₃/ABO_x](M=Fe, Fe_0.8Mn_0.2 A=La, Ca B=Fe, Mn) Superlattices Grown by Pulsed Laser Deposition Method.

^○（M1）Yuta Watabe¹, Yoshito Tuchiya¹, Takahiro Oikawa¹, Nobuyuki Iwata¹, Takuya Hashimoto², Hiroshi Yamamoto¹ (CST Nihon Univ.¹, CHS Nihon Univ.²)

[29p-F2-15] Interfacial capacitance of Fe₃O₄/Nb:SrTiO₃

^○Ryota Takahashi¹, Mikk Lippmaa¹ (ISSP, University of Tokyo¹)

[29p-F2-16] Fabrication of VO₂ free-standing microstructures and their transport properties

^○Shota Yamasaki¹, Teruo Kanki¹, Luca Pellegrino², Nicola Manca^2,3, Antonio Siri^2,3, Daniele Marre^2,3, Hidekazu Tanaka¹ (Osaka Univ.¹, CNR-SPIN², Genova Univ.³)

[29p-F2-17] Local formation of metal-insulator electronic phase interface in VO2 micro-wires and their transport properties

^○（DC）Hidefumi Takami¹, Teruo Kanki¹, Hidekazu Tanaka¹ (ISIR, Osaka Univ.¹)

[29p-F2-18] Structural transition and MIT of VO₂ thin films with M2 phase grown on glass substrates

^○Kunio Okimura¹, Tomo Watanabe¹, Joe Sakai² (Tokai Univ.¹, Tours Univ.²)

[29p-F2-19] Growth of VO₂ thin film on Ti/Si(100) by using ICP-assisted sputtering and its vertical switching

^○Suruz Md.¹, Kunio Okimura¹ (Tokai unv.¹)

Session information

[29p-F2-1~19] 6.3 Oxide-based electronics