[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-5] Reaction potentials of F2+NOx(x=1-2) and the rate coefficients

^○Toshio Hayashi¹, Satomi Tajima¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

Keywords:Chemical Dry Etching、CDE、Gas etching