[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-7] Influence of last process on gas phase radical density in H2/N2 plasma and its control

^○Suzuki Toshiya¹, Takeda Keigo^1,2, Kondo Hiroki¹, Ishikawa Kenji¹, Sekine Makoto^1,2, Hori Masaru^1,2 (Nagoya University¹, JST-CREST²)

Keywords:半導体、プラズマ、制御