[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-10] Structural information from IR spectroscopy on SiN_x deposited from SiH₄+N₂ gas mixture using VHF-PECVD

^○Shin-ichi Kobayashi¹ (Tokyo Polytechnic Univ.¹)

Keywords:窒化シリコン膜、化学的気相成長、プラズマ成膜