The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Poster presentation)

13. Semiconductors A (Silicon) » 13.5 Si process technology

[27p-PB4-1~16] 13.5 Si process technology

Wed. Mar 27, 2013 1:30 PM - 3:30 PM PB4 (2nd gymnasium)

[27p-PB4-16] Tungsten-Based Pillar Deposition by Helium Ion Microscope and Beam-Substrate Interaction

○(P)Kazuyuki Kohama1,2, Tomohiko Iijima1, Misa Hayashida1, Shinichi Ogawa1 (AIST1, JSPS2)

Keywords:HIM、ブリスタリング、エッチング