[27p-PB4-1~16] 13.5 Si process technology

[27p-PB4-8] Development of Al Damage-less Insulating Film Etchant

^○Tsuguhiro Tago^1,2, Kunio Ichino², Mayumi Kimura¹, Atsushi Matsui¹ (HAYASHI PURE CHEMICAL IND.,LTD¹, Graduate School of Engineering, Tottori University²)

Keywords:Alダメージレス絶縁膜エッチング剤、エッチング剤