[28a-A5-1~6] 8.4 Plasma etching

[28a-A5-2] Analysis of Neutral Beam Generation Mechanism by First-Principle Electronic Structure Calculation VII

^○Naoki Watanabe¹, Shingo Otsuka¹, Takuya Iwasaki¹, Kohei Ono¹, Yasuro Irie¹, Shinji Ueki², Osamu Nukaga³, Masakazu Sugiyama^2,4, Tomohiro Kubota^2,5, Seiji Samukawa^2,5 (Mizuho Information & Research Institute, Inc.¹, BEANS project 3D BEANS center², Fujikura Ltd.³, University of Tokyo⁴, Tohoku University⁵)

Keywords:Kohn-Sham、DFT