[28a-A5-1~6] 8.4 Plasma etching

[28a-A5-3] Modeling of Neutral Beam-Surface Interaction and Etching Profile Simulation (3)

^○Ohtsuka Shingo¹, Naoki Watanabe¹, Takuya Iwasaki¹, Kohei Ono¹, Yasuro Iriye¹, Syunsuke Mochizuki², Kazuhiro Miwa³, Masakazu Sugiyama^3,4, Tomohiro Kubota^3,5, Seiji Samukawa^3,5 (Mizuho Information & Research Institute, Inc.¹, Mathematical Systems, Inc.², BEANS project 3D BEANS center³, Univ. of Tokyo⁴, Tohoku Univ.⁵)

Keywords:中性粒子ビーム