[28a-A5-1~6] 8.4 Plasma etching

[28a-A5-5] Distribution of Atomic Hydrogen Density between Substrate and Electrode in High-Rate Etching of Si by Microwave Hydrogen Plasma

^○Takahiro Yamada^1,2, Kosuke Yamada¹, Hiromasa Ohmi^1,2, Hiroaki Kakiuchi^1,2, Kiyoshi Yasutake^1,2 (Osaka Univ.¹, JST CREST²)

Keywords:太陽電池、エッチング、シラン