[28a-G6-1~11] 13.5 Si process technology

[28a-G6-3] Minimal System of Mask-less Exposure Equipment

^○Ryouichi Irita^1,2, Kenji Miyake^1,2, Norio Umeyama², Sommawan Khumpuang^2,3, Shiro Hara^2,3 (PMT¹, MINIMAL², AIST³)

Keywords:ミニマル、マスクレス、露光