The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

07. Beam Technology and Nanofabrication » 7.3 Lithography

[28p-B2-1~13] 7.3 Lithography

Thu. Mar 28, 2013 1:30 PM - 5:00 PM B2 (K2 3F-1302)

[28p-B2-3] Aberration-Collection of Electron Optics for Massively Parallel EB Lithography

○Akira Kojima1,2, Naokatu Ikegami2, Takashi Yoshida3, Hiroshi Miyaguchi3, Hideyuki Ohyi1, Nobuyoshi Koshida2, Masayoshi Esashi3 (Crestec Co.1, Tokyo Univ. A&T2, Tohoku Univ.3)

Keywords:電子ビーム、超並列、ncSi