[28p-B2-1~13] 7.3 Lithography

[28p-B2-9] The mitigation of the development of the high sensitive EUV resist

^○Takeo Watanabe¹, Kazuya Emura¹, Daiju Shiono², Yuichi Haruyama¹, katsumi Ohmori², Kazufumi Sato², Testuo Harada¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹, Tokyo Ohka²)

Keywords:EUVリソグラフィ、EUVレジスト、SR吸収分光