The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.5 Si process technology

[28p-G6-1~17] 13.5 Si process technology

Thu. Mar 28, 2013 2:00 PM - 6:30 PM G6 (B5 1F-2106)

[28p-G6-8] Chemical Analysis of As+ Implanted Germanium -Implantation Temperature Dependence-

○Takahiro Ono1, Akio Ohta1, Hiroaki Hanafusa1, Hideki Murakami1, Seiichiro Higashi1, Seiichi Miyazaki2 (Grad. School of AdSM, Hiroshima Univ.1, Grad. School of Eng., Nagoya Univ.2)

Keywords:Ge、イオン注入