The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.2 Semiconductor surfaces

[28p-G8-1~14] 13.2 Semiconductor surfaces

Thu. Mar 28, 2013 1:00 PM - 4:45 PM G8 (B5 2F-2202)

[28p-G8-11] Mechanism of wet etching in nanoscale region

○Atsushi Okuyama1, Suguru Saito1, Yoshiya Hagimoto2, Hayato Iwamoto2 (Sony Semiconductor1, Sony2)

Keywords:ウェットエッチング