[28p-G8-1~14] 13.2 Semiconductor surfaces

[28p-G8-13] △Study on reaction mechanism of polymer removal by wet ozone (4)

^○（DC）Yousuke Goto¹, Yukihiro Angata¹, Emi Tsukazaki¹, Seiji Takahashi¹, Kunihiko Koike², Tadaaki Yamagishi³, Hideo Horibe¹ (Kanazawa Inst. of Technol.¹, Iwatani Corp.², Kanazawa Univ.³)

Keywords:レジスト除去、湿潤オゾン