[28p-G8-1~14] 13.2 Semiconductor surfaces

[28p-G8-6] ▲Investigation of Si surface roughness on 3-D MOS capacitor with ultrathin HfON gate insulator formed by ECR plasma sputtering

^○Dae-Hee Han¹, Shun-ichiro Ohmi¹ (Tokyo Inst. of Tech.¹)

Keywords:surface roughness