The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.2 Semiconductor surfaces

[28p-G8-1~14] 13.2 Semiconductor surfaces

Thu. Mar 28, 2013 1:00 PM - 4:45 PM G8 (B5 2F-2202)

[28p-G8-8] Behavior of Transition Metals Penetrating Silicon Substrate by Ion Implantation and Anneal

○Keiji Ueno1, Koichiro Saga2, Shunsuke Kobayashi3, Koji Sueoka3 (Sony Semiconductor1, Sony2, Okayama Pref Univ.3)

Keywords:半導体、金属汚染