△Characteristic Impedance Measurement Method for Monitoring of Plasma Processing

Presentation information

Regular sessions(Oral presentation)

08. Plasma Electronics » 8.2 Plasma measurements and diagnostics

Fri. Mar 29, 2013 9:00 AM - 11:45 AM B8 (K2 4F-1406)

^○Taisei Motomura¹, Yuji Kasashima¹, Fumihiko Uesugi¹, Hiroyuki Kurita², Naoya Kimura² (MSRC, AIST¹, Advantest Corporation²)

Keywords:プラズマ、インピーダンス