[29a-B8-1~10] 8.2 Plasma measurements and diagnostics

[29a-B8-9] △Anomaly Detection in Plasma Processing Using ESC Wafer Stage with Built-in AE Sensors

^○Yuji Kasashima¹, Tatsuo Tabaru¹, Yoshikazu Kobayashi², Yasaka Mitsuo³, Sakamoto Shingo⁴, Akiyama Morito¹, Nabeoka Natsuko¹, Motomura Taisei¹, Uesugi Fumihiko¹ (AIST¹, Creative Technology Corp.², Sojo Univ.³, Renesas Semiconductor Kyushu Yamaguchi Co., Ltd.⁴)

Keywords:AEセンサ、異常検出