The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Oral presentation)

08. Plasma Electronics » 8.2 Plasma measurements and diagnostics

[29a-B8-1~10] 8.2 Plasma measurements and diagnostics

Fri. Mar 29, 2013 9:00 AM - 11:45 AM B8 (K2 4F-1406)

[29a-B8-9] △Anomaly Detection in Plasma Processing Using ESC Wafer Stage with Built-in AE Sensors

Yuji Kasashima1, Tatsuo Tabaru1, Yoshikazu Kobayashi2, Yasaka Mitsuo3, Sakamoto Shingo4, Akiyama Morito1, Nabeoka Natsuko1, Motomura Taisei1, Uesugi Fumihiko1 (AIST1, Creative Technology Corp.2, Sojo Univ.3, Renesas Semiconductor Kyushu Yamaguchi Co., Ltd.4)

Keywords:AEセンサ、異常検出