[29a-B9-1~12] 8.1 Plasma production and control

[29a-B9-10] △Dependence of Magnetic Field Strength around the Mirror Bottom on Beam Current from the 2nd Stage of the Tandem Type ECRIS

^○（M2）Dai Nozaki¹, Yosuke Kurisu¹, Keisuke Yano¹, Daiju Kimura¹, Noriyuki Kawashima², Sho Kumakura², Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (Osaka Univ.¹, Osaka Univ.²)

Keywords:ECRイオン源、イオンビーム、磁場強度