The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Oral presentation)

08. Plasma Electronics » 8.1 Plasma production and control

[29a-B9-1~12] 8.1 Plasma production and control

Fri. Mar 29, 2013 9:00 AM - 12:15 PM B9 (K2 4F-1407)

[29a-B9-9] △Measurement of basic characteristics in the 2nd stage plasma of tandem type ECRIS

○(M1)Keisuke Yano1, Dai Nozaki1, Yosuke Kurisu1, Daiju Kimura1, Noriyuki Kawashima2, Sho Kumakura2, Fuminobu Sato1, Yushi Kato1, Toshiyuki Iida1 (Osaka Univ.1, Osaka Univ.2)

Keywords:ECR、イオン源