The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

08. Plasma Electronics » 8.1 Plasma production and control

[29a-B9-1~12] 8.1 Plasma production and control

Fri. Mar 29, 2013 9:00 AM - 12:15 PM B9 (K2 4F-1407)

[29a-B9-12] Effect of applying negative DC bias voltage to cathode for RF magnetron sputter

○Kouhei Osuga1, Toshinori Yamada2, Haruo Shindo2, Masao Isomura1,2 (Tokai Univ.1, Tokai Univ.2)

Keywords:plasma