The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[29p-B1-1~20] 7.4 Nanoimprint

Fri. Mar 29, 2013 1:30 PM - 6:45 PM B1 (K2 3F-1301)

[29p-B1-1] Fabrication of Mixed Patterns with Nano and Micron Sizes by Selective Edge Lithography

○Hayato Noma1, Jyunji Sakamoto1, Hiroaki Kawata1, Masaaki Yasuda1, Yoshihiko Ｈｉｒａｉ1 (osaka prefecture univ1)

Keywords:nanoimprint、edge lithgraphy、nano micron mixture patterns