[29p-B1-1~20] 7.4 Nanoimprint

[29p-B1-13] △Evaluation of uniform residual layer creation using Capacity-equalized mold with sub-100nm patterns

^○Kenta Suzuki^1,2,3, Sung-Won Youn^2,3, Qing Wang^2,3, Hiroshi Hiroshima^2,3, Yasushiro Nishioka¹ (Nihon Univ.¹, AIST², JST-CREST³)

Keywords:UVナノインプリント、残膜、容積均一化モールド