The 60th JSAP Spring Meeting,2013

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Regular sessions(Oral presentation)

07. Beam Technology and Nanofabrication » 7.6 Ion beams

[29p-B2-1~18] 7.6 Ion beams

Fri. Mar 29, 2013 1:30 PM - 6:15 PM B2 (K2 3F-1302)

[29p-B2-13] High-speed Reactive Etching with ClF3 Neutral Cluster Beam

○Toshio Seki1, Yu Yoshino2, Takehiko Senoo2, Kunihiko Koike2, Takaaki Aoki1, Jiro Matsuo1 (Kyoto Univ.1, Iwatani Corp.2)

Keywords:クラスター