[29p-B2-1~18] 7.6 Ion beams

[29p-B2-17] Irradiation effects on the fabrication of highly-oriented β-FeSi₂ thin film using an ion beam

^○satoshi hamamoto^1,2, kenji yamaguchi², kiichi hojo² (Ibaraki Univ.¹, Japan Atomic Energy Agency²)

Keywords:sputter etching、ion irradiation、thin film