[29p-B8-1~10] Frontiers of process technology for Si-related thin films

[29p-B8-7] Very High Speed Grain Growth of Amorphous Silicon Film Induced by Atmospheric Pressure Micro-Thermal-Plasma-Jet Irradiation

^○Shohei Hayashi^1,2, Yuji Fujita¹, Seiji Morisaki¹, Takahiro Kamikura¹, Muneki Akazawa¹, Kohei Sakaike¹, Seiichiro Higashi¹ (Hiroshima Univ.¹, JSPS Research Fellow DC²)

Keywords:マイクロ熱プラズマジェット、結晶化、シリコン