[29p-G7-1~19] 14.1 Physical properties of exploratory materials

[29p-G7-16] Reduction of Oxygen in Noble Gas - Silicon Mixture Films II

^○Ryuji Okumura¹, Hitoe Habuchi², Shiori Fujita¹, Tamio Iida¹, Fumitaka Ohashi³, Tetsuji Kume³, Takayuki Ban³, Syuichi Nonomura³ (Gifu Natl. Coll. Technol¹, Toyota Natl. Coll. Technol², Gifu Univ³)

Keywords:クラスレート、薄膜、シリコン